Teachers from public schools, as well as administrators including teacher trainers, curriculum developers, textbook writers, and ministry of education officials, are encouraged to apply for a 5-week SUSI summer program in the U.S. Application deadline: January 11th.
The Study of the U.S. Institutes (SUSI) for Secondary Educators are intensive post-graduate level academic programs with integrated study tours whose purpose is to provide foreign secondary educators and administrators the opportunity to deepen their understanding of U.S. society, culture, values, and institutions. The ultimate goal of the Institutes is to strengthen curricula and to enhance the quality of teaching about the United States in secondary schools and other academic institutions abroad.
The program will take place over the course of five weeks in June 2018. Two types of institutes for Secondary Educators will be offered – with a focus on classroom teachers and a focus on administrators including teacher trainers, curriculum developers, textbook writers, and ministry of education officials, among others. Each Institute will have 20 participants and will include a four week academic residency component and a one week integrated study tour.
Candidates should be mid-career, typically between the ages of 30-50, highly-motivated and experienced secondary school teachers and administrators. Ideal candidates are individuals who are seeking to introduce or enhance aspects of U.S. studies into their curricula or to offer specialized seminars/workshops for education professionals in U.S. studies or related fields. While the nominee’s scholarly and professional credentials are an important consideration, the potential impact and multiplier effect of the Institute is equally important.
Candidates must demonstrate English language fluency. Institutes are rigorous and demanding programs; participants will be expected to handle substantial reading assignments in English and to fully and actively participate in all seminar and panel discussions.
For additional information on the program and application process see the file attached here (PDF 190 KB).
